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Microstructural modification in Co/Cu multilayers prepared by low energy ion-assisted deposition

Telling, N.D; Crapper, M.D; Lovett, D.R; Guilfoyle, S.J; Tang, C.C; Petty, M

Authors

M.D Crapper

D.R Lovett

S.J Guilfoyle

C.C Tang

M Petty



Abstract

The microstructure of Co/Cu multilayers deposited by low energy ion-assisted deposition was investigated. The samples studied were grown by unbalanced magnetron sputtering with and without an applied d.c. substrate bias of −50 V. Specular and off-specular X-ray reflectivity measurements were performed on the samples and revealed the presence of roughness at the interfaces that was partially correlated throughout the film. The effect of applying a −50 V bias was to suppress the correlation of the lower frequency roughness and to slightly reduce the bilayer period of the multilayer. The differences between the samples are discussed in terms of possible ion bombardment induced smoothing of the layers and densification of the microstructure.

Citation

Telling, N., Crapper, M., Lovett, D., Guilfoyle, S., Tang, C., & Petty, M. (1998). Microstructural modification in Co/Cu multilayers prepared by low energy ion-assisted deposition. Thin Solid Films, 317(1-2), 278-281. https://doi.org/10.1016/s0040-6090%2897%2900537-3

Journal Article Type Article
Online Publication Date Feb 26, 1999
Publication Date 1998-04
Deposit Date May 16, 2024
Journal Thin Solid Films
Print ISSN 0040-6090
Publisher Elsevier
Peer Reviewed Peer Reviewed
Volume 317
Issue 1-2
Pages 278-281
DOI https://doi.org/10.1016/s0040-6090%2897%2900537-3
Keywords Co/Cu multilayers; Ion-assisted deposition; Magnetron sputtering
Public URL https://keele-repository.worktribe.com/output/828729