Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers

Telling, N. D.; Faunce, C. A.; Bonder, M. J.; Grundy, P. J.; Lord, D. G.; Van den Berg, J. A.; Langridge, S.

Abstract

Interdiffusion and intermixing have been examined in Fe/Si trilayers prepared with ions of different energies, using the direct ion beam deposition technique. Isotope-pure layers were deposited and spin-polarized neutron reflectivity used to determine the role of Fe diffusion in iron silicide formation. It was found that a nonmagnetic iron silicide was formed that contained Fe from both the top and bottom layers in the trilayer, suggesting complete diffusion across the spacer region. Electron microscopy observations revealed the presence of an iron silicide phase and crystalline interface layers in films prepared with low energy ions (30 eV), while mixed and amorphous-like regions were found at higher ion energies (100 eV).

Citation

Telling, N. D., Faunce, C. A., Bonder, M. J., Grundy, P. J., Lord, D. G., Van den Berg, J. A., & Langridge, S. (2001). Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers. Journal of Applied Physics, 89(11), 7074-7076. https://doi.org/10.1063/1.1357151

• Journal Article Type: Article
• Online Publication Date: Jun 1, 2001
• Publication Date: Jun 1, 2001
• Deposit Date: May 16, 2024
• Journal: Journal of Applied Physics
• Print ISSN: 0021-8979
• Electronic ISSN: 1089-7550
• Publisher: AIP Publishing
• Peer Reviewed: Peer Reviewed
• Volume: 89
• Issue: 11
• Pages: 7074-7076
• DOI: https://doi.org/10.1063/1.1357151
• Public URL: https://keele-repository.worktribe.com/output/828786