Substrate-Induced Strain in Molybdenum Disulfide Thin Films Grown by Aerosol-Assisted Chemical Vapour Deposition

Adams, L.J.; Morbec, J.M.; Matthews, P.D.; Balakrishnan, Nilanthy

Abstract

Transition metal dichalcogenides have been extensively studied in recent years because of their fascinating optical, electrical, and catalytic properties. However, low-cost, scalable production remains a challenge. Aerosolassisted chemical vapour deposition (AACVD) provides a new method for scalable thin film growth. In this study, we demonstrate the growth of molybdenum disulfide (MoS2) thin films using AACVD method. This method proves its suitability for low temperature growth of MoS2 thin films on various substrates, including glass, silicon dioxide, quartz, silicon, hexagonal boron nitride, and highly ordered pyrolytic graphite. The as-grown MoS2 shows evidence of substrateinduced strain [1]. The type of strain and the morphology of the as-grown MoS2 highly depend on the growth substrate's surface roughness, crystallinity, and chemical reactivity. Moreover, the as-grown MoS2 shows the presence of both direct and indirect band gaps, suitable for exploitation in future electronics and optoelectronics.

REFERENCE
[1] L. J. Adams, P. D. Matthews, J. M. Morbec, N. Balakrishnan, Substrate-induced strain in molybdenum disulfide grown by aerosol-assisted chemical vapor deposition, Nanotechnology, 35, 395602 (2024).

Citation

Adams, L., Morbec, J., Matthews, P., & Balakrishnan, N. (2025, April). Substrate-Induced Strain in Molybdenum Disulfide Thin Films Grown by Aerosol-Assisted Chemical Vapour Deposition. Presented at 6 th International Conference on Nanomaterials, Nanofabrication and Nanocharacterization, Oludeniz, Turkey

• Presentation Conference Type: Conference Abstract
• Conference Name: 6 th International Conference on Nanomaterials, Nanofabrication and Nanocharacterization
• Start Date: Apr 8, 2025
• End Date: Apr 14, 2025
• Acceptance Date: Dec 23, 2024
• Publication Date: Apr 8, 2025
• Deposit Date: May 10, 2025
• Publicly Available Date: May 19, 2025
• Peer Reviewed: Peer Reviewed
• Public URL: https://keele-repository.worktribe.com/output/1236340
• Publisher URL: https://www.nanomach.org/images/files/nanomach%202025%20abstract%20book.pdf