Lewis J Adams
Substrate-induced strain in molybdenum disulfide grown by aerosol-assisted chemical vapor deposition
Adams, Lewis J; Matthews, Peter D; Morbec, Juliana M; Balakrishnan, Nilanthy
Authors
Peter Matthews p.d.matthews@keele.ac.uk
Dr Juliana Maria Abreu Da Silva Morbec j.morbec@keele.ac.uk
Dr Nilanthy Balakrishnan n.balakrishnan@keele.ac.uk
Abstract
Transition metal dichalcogenides have been extensively studied in recent years because of their fascinating optical, electrical, and catalytic properties. However, low-cost, scalable production remains a challenge. Aerosol-assisted chemical vapor deposition (AACVD) provides a new method for scalable thin film growth. In this study, we demonstrate the growth of molybdenum disulfide (MoS2) thin films using AACVD method. This method proves its suitability for low-temperature growth of MoS2 thin films on various substrates, such as glass, silicon dioxide, quartz, silicon, hexagonal boron nitride, and highly ordered pyrolytic graphite. The as-grown MoS2 shows evidence of substrate-induced strain. The type of strain and the morphology of the as-grown MoS2 highly depend on the growth substrate's surface roughness, crystallinity, and chemical reactivity. Moreover, the as-grown MoS2 shows the presence of both direct and indirect band gaps, suitable for exploitation in future electronics and optoelectronics.
Citation
Adams, L. J., Matthews, P. D., Morbec, J. M., & Balakrishnan, N. (in press). Substrate-induced strain in molybdenum disulfide grown by aerosol-assisted chemical vapor deposition. Nanotechnology, 35(39), Article 395602. https://doi.org/10.1088/1361-6528/ad5dc1
Journal Article Type | Article |
---|---|
Acceptance Date | Jul 2, 2024 |
Online Publication Date | Jul 11, 2024 |
Deposit Date | Jul 6, 2024 |
Publicly Available Date | Jul 16, 2024 |
Journal | Nanotechnology |
Print ISSN | 0957-4484 |
Electronic ISSN | 1361-6528 |
Publisher | IOP Publishing |
Peer Reviewed | Peer Reviewed |
Volume | 35 |
Issue | 39 |
Article Number | 395602 |
DOI | https://doi.org/10.1088/1361-6528/ad5dc1 |
Keywords | thin films, aerosol-assisted chemical vapor deposition, strain, molybdenum disulfide, transition metal dichalcogenides |
Public URL | https://keele-repository.worktribe.com/output/873538 |
Publisher URL | https://iopscience.iop.org/article/10.1088/1361-6528/ad5dc1 |
Additional Information | This work was supported by the Keele University, Royal Society [under grants RSG/R2/212359, and SIF/R2/212004], Engineering and Physical Sciences Research Council (EPSRC) [under grant EP/V043412/1], the UK Government and the European Union [under SEND programme 32R16P00706]. |
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