Microstructure of Fe–N thin films prepared using an atomic nitrogen beam

Telling, N. D.; Jones, G. A.; Faunce, C. A.; Grundy, P. J.; Blythe, H. J.; Joyce, D. E.

Abstract

The formation of Fe–N thin films by exposure to an atomic (free radical) nitrogen beam is reported. This new method of preparing Fe–N films uses fluxes of highly reactive, thermal energy N atoms that do not disturb the film microstructure. It is shown that by careful control of the exposure conditions, a range of predominantly single phase films can be obtained. At low nitrogen concentrations an amorphous-like phase is observed, whereas crystalline phases of
and ζ
are formed at higher concentrations. Dramatic differences in the microstructure and crystallographic texture of these films reveal the inherent microstructure of the different phases rather than the influence of the growth technique.

Citation

Telling, N. D., Jones, G. A., Faunce, C. A., Grundy, P. J., Blythe, H. J., & Joyce, D. E. (2001). Microstructure of Fe–N thin films prepared using an atomic nitrogen beam. Journal of Vacuum Science and Technology A, 19(2), 405-409. https://doi.org/10.1116/1.1339016

• Journal Article Type: Article
• Acceptance Date: Nov 13, 2000
• Publication Date: Mar 1, 2001
• Deposit Date: May 16, 2024
• Journal: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
• Print ISSN: 0734-2101
• Electronic ISSN: 1520-8559
• Publisher: AIP Publishing
• Peer Reviewed: Peer Reviewed
• Volume: 19
• Issue: 2
• Pages: 405-409
• DOI: https://doi.org/10.1116/1.1339016
• Public URL: https://keele-repository.worktribe.com/output/828777
• Publisher URL: https://pubs.aip.org/avs/jva/article-abstract/19/2/405/243427/Microstructure-of-Fe-N-thin-films-prepared-using?redirectedFrom=PDF