Preparation of short-period Fe-N magnetic multilayers using an atomic nitrogen beam

Telling, N.D.; Bonder, M.J.; Jones, G.A.; Faunce, C.A.; Grundy, P.J.; Lord, D.G.; Joyce, D.E.

Abstract

Magnetic multilayers containing Fe-N layers with bilayer periods of between /spl sim/15-84 /spl Aring/ and sharp interfaces, are successfully grown using an atomic (free radical) nitrogen beam. The phase composition and microstructure is found to be a function of the initial Fe layer thickness prior to nitrogenation. Generally, higher N content phases are found as the initial Fe layer is reduced. Small grains (/spl sim/10 nm) are observed in multilayers containing /spl alpha/-Fe and /spl gamma/-Fe/sub 4/N phases. In these films, a perpendicular anisotropy is found for a certain thickness of the Fe layers. A stripe domain structure associated with this anisotropy is observed. The origin of this anisotropy may be induced stress caused by lattice mismatch between layers and/or lattice dilation due to N incorporation.

Citation

Telling, N., Bonder, M., Jones, G., Faunce, C., Grundy, P., Lord, D., & Joyce, D. (2001). Preparation of short-period Fe-N magnetic multilayers using an atomic nitrogen beam. IEEE Transactions on Magnetics, 37(4), 2308-2310. https://doi.org/10.1109/20.951156

• Journal Article Type: Article
• Publication Date: 2001-07
• Deposit Date: May 16, 2024
• Journal: IEEE Transactions on Magnetics
• Print ISSN: 0018-9464
• Publisher: Institute of Electrical and Electronics Engineers (IEEE)
• Peer Reviewed: Peer Reviewed
• Volume: 37
• Issue: 4
• Pages: 2308-2310
• DOI: https://doi.org/10.1109/20.951156
• Public URL: https://keele-repository.worktribe.com/output/828801
• Publisher URL: https://ieeexplore.ieee.org/abstract/document/951156