Outputs (117)

Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers (2001)
Journal Article
Telling, N. D., Faunce, C. A., Bonder, M. J., Grundy, P. J., Lord, D. G., Van den Berg, J. A., & Langridge, S. (2001). Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers. Journal of Applied Physics, 89(11), 7074-7076. https://doi.org/10.1063/1.1357151

Interdiffusion and intermixing have been examined in Fe/Si trilayers prepared with ions of different energies, using the direct ion beam deposition technique. Isotope-pure layers were deposited and spin-polarized neutron reflectivity used to determin... Read More about Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers.

Fe–N alloy films prepared using a nitrogen atom source (2001)
Journal Article
Telling, N., Jones, G., Grundy, P., & Blythe, H. (2001). Fe–N alloy films prepared using a nitrogen atom source. Journal of Magnetism and Magnetic Materials, 226-230, 1659-1661. https://doi.org/10.1016/s0304-8853%2800%2901103-3

We have studied the magnetic and structural properties of Fe–N alloy films prepared by magnetron sputtering in the presence of a highly reactive beam of atomic nitrogen. The nitrogen content was varied by altering the exposure time of the growing fil... Read More about Fe–N alloy films prepared using a nitrogen atom source.

Microstructure of Fe–N thin films prepared using an atomic nitrogen beam (2001)
Journal Article
Telling, N. D., Jones, G. A., Faunce, C. A., Grundy, P. J., Blythe, H. J., & Joyce, D. E. (2001). Microstructure of Fe–N thin films prepared using an atomic nitrogen beam. Journal of Vacuum Science and Technology A, 19(2), 405-409. https://doi.org/10.1116/1.1339016

The formation of Fe–N thin films by exposure to an atomic (free radical) nitrogen beam is reported. This new method of preparing Fe–N films uses fluxes of highly reactive, thermal energy N atoms that do not disturb the film microstructure. It is show... Read More about Microstructure of Fe–N thin films prepared using an atomic nitrogen beam.

Spin polarised neutron and X-ray reflectivity study of a Co/Cu multilayer deposited under ion bombardment (1999)
Journal Article
Telling, N., Langridge, S., & Tang, C. (1999). Spin polarised neutron and X-ray reflectivity study of a Co/Cu multilayer deposited under ion bombardment. Journal of Magnetism and Magnetic Materials, 198-199, 692-694. https://doi.org/10.1016/s0304-8853%2898%2901204-9

Spin polarised neutron reflectivity and X-ray reflectivity measurements were performed on a Co/Cu multilayer deposited under ion bombardment. It was found that an average ion energy of ∼200 eV caused a reduction in interface roughness towards the sur... Read More about Spin polarised neutron and X-ray reflectivity study of a Co/Cu multilayer deposited under ion bombardment.

The effect of energetic ion bombardment during growth on the interface structure of Co/Cu multilayers (1999)
Journal Article
Telling, N., Karlsson, C., Crapper, M., & Tang, C. (1999). The effect of energetic ion bombardment during growth on the interface structure of Co/Cu multilayers. Journal of Magnetism and Magnetic Materials, 198-199, 713-715. https://doi.org/10.1016/s0304-8853%2898%2901015-4

A modified unbalanced magnetron sputtering technique was applied to the growth of multilayer Co/Cu films in order to systematically study the interface structure evolved under ion bombardment. X-ray reflectivity measurements revealed an interface smo... Read More about The effect of energetic ion bombardment during growth on the interface structure of Co/Cu multilayers.

Reflectivity and diffraction study of Co/Cu multilayer using synchrotron X-rays (1999)
Journal Article
Tang, C., MacLean, E., & Telling, N. (1999). Reflectivity and diffraction study of Co/Cu multilayer using synchrotron X-rays. Journal of Magnetism and Magnetic Materials, 198-199, 653-655. https://doi.org/10.1016/s0304-8853%2898%2901176-7

Synchrotron powder diffraction measurements were obtained from a Co/Cu multilayer produced by low energy ion-assisted deposition. The experiment was carried out on the high resolution diffractometer on Station 2.3 at the SRS, Daresbury Laboratory. Ex... Read More about Reflectivity and diffraction study of Co/Cu multilayer using synchrotron X-rays.

Multilayer growth by low energy ion beam deposition (1999)
Journal Article
Joyce, D., Telling, N., Van den Berg, J., Lord, D., & Grundy, P. (1999). Multilayer growth by low energy ion beam deposition. Journal of Magnetism and Magnetic Materials, 198-199, 731-733. https://doi.org/10.1016/s0304-8853%2898%2901021-x

We report our progress in the development of a relatively new deposition technique, that of direct low energy ion beam deposition. We describe this technique, which is based on ion implanter technology similar to that used in the semiconductor indust... Read More about Multilayer growth by low energy ion beam deposition.

Synchrotron X-ray reflectivity study of Co/Cu multilayer structure (1998)
Journal Article
Tang, C., Telling, N., & Langridge, S. (1998). Synchrotron X-ray reflectivity study of Co/Cu multilayer structure. Physica B: Condensed Matter, 248(1-4), 395-398. https://doi.org/10.1016/s0921-4526%2898%2900270-1

We report on the use of Station 2.3 at the SRS Daresbury Laboratory as a high resolution reflectivity diffractometer (HRRD) for the study of interfacial structure in a Co/Cu multilayer grown using the ion-assisted deposition method. Specular, off-spe... Read More about Synchrotron X-ray reflectivity study of Co/Cu multilayer structure.

Microstructural modification in Co/Cu multilayers prepared by low energy ion-assisted deposition (1998)
Journal Article
Telling, N., Crapper, M., Lovett, D., Guilfoyle, S., Tang, C., & Petty, M. (1998). Microstructural modification in Co/Cu multilayers prepared by low energy ion-assisted deposition. Thin Solid Films, 317(1-2), 278-281. https://doi.org/10.1016/s0040-6090%2897%2900537-3

The microstructure of Co/Cu multilayers deposited by low energy ion-assisted deposition was investigated. The samples studied were grown by unbalanced magnetron sputtering with and without an applied d.c. substrate bias of −50 V. Specular and off-spe... Read More about Microstructural modification in Co/Cu multilayers prepared by low energy ion-assisted deposition.

Interface modification in Co/Cu multilayers prepared by ion-assisted deposition (1998)
Thesis
Telling, N. Interface modification in Co/Cu multilayers prepared by ion-assisted deposition. (Thesis). Loughborough University. https://keele-repository.worktribe.com/output/828742

The interfacial structure of Co/Cu multilayers deposited under energetic ion bombardment has been investigated using X-ray reflectivity techniques. An ionassisted deposition system, based on unbalanced magnetron sputtering principles, has been develo... Read More about Interface modification in Co/Cu multilayers prepared by ion-assisted deposition.